Non-isoplanatic lens aberration correction in dark-field digital holographic microscopy for semiconductor metrology

In the semiconductor industry, the demand for more precise and accurate overlay metrology tools has increased because of the continued shrinking of feature sizes in integrated circuits. To achieve the required sub-nanometre precision, the current technology for overlay metrology has become complex a...

पूर्ण विवरण

ग्रंथसूची विवरण
मुख्य लेखकों: Tamar van Gardingen-Cromwijk, Sander Konijnenberg, Wim Coene, Manashee Adhikary, Teus Tukker, Stefan Witte, Johannes F. de Boer, Arie den Boef
स्वरूप: लेख
भाषा:English
प्रकाशित: Light Publishing Group 2024-02-01
श्रृंखला:Light: Advanced Manufacturing
विषय:
ऑनलाइन पहुंच:https://www.light-am.com/article/doi/10.37188/lam.2023.041