Non-isoplanatic lens aberration correction in dark-field digital holographic microscopy for semiconductor metrology
In the semiconductor industry, the demand for more precise and accurate overlay metrology tools has increased because of the continued shrinking of feature sizes in integrated circuits. To achieve the required sub-nanometre precision, the current technology for overlay metrology has become complex a...
| Main Authors: | , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Light Publishing Group
2024-02-01
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| Series: | Light: Advanced Manufacturing |
| Subjects: | |
| Online Access: | https://www.light-am.com/article/doi/10.37188/lam.2023.041 |