Study the effect of doping for various materials (F, Sb) on the properties of tin oxide (SnO2) film
In this research doped and undoped SnO2 was prepared by using cold wall atmospheric pressure chemical vapor deposition (APCVD) system at substrate temperature (450 0C) and flow rate of O2 gas (1.5) L/M for (15) min using (SnCl2.5H2O) and different percentage from (NH3F) , (SbCl3) as source for (Sn,...
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| Formato: | Artigo |
| Idioma: | English |
| Publicado em: |
Unviversity of Technology- Iraq
2015-11-01
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| coleção: | Engineering and Technology Journal |
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| Acesso em linha: | https://etj.uotechnology.edu.iq/article_117444_a9829ff899710b6b5107c28e1237d710.pdf |