Thin Ferromagnetic Films Deposition by Facing Target Sputtering Method
Facing targets sputtering system, constructed specially for ferromagnetic cathode sputtering, was investigated in this study. The currentvoltage (I-V ) characteristics, deposition rate dependence on the discharge power, dependence on the distance between the center axis of targets and substrate, and...
| Główni autorzy: | , , , |
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| Format: | Artykuł |
| Język: | English |
| Wydane: |
Vilnius University Press
2005-01-01
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| Seria: | Nonlinear Analysis |
| Hasła przedmiotowe: | |
| Dostęp online: | http://www.zurnalai.vu.lt/nonlinear-analysis/article/view/15134 |