Optimization of Electron-Beam Evaporation Process Parameters for ZrN Thin Films by Plasma Treatment and Taguchi Method

Optimization of Electron-Beam Evaporation Process Parameters for ZrN Thin Films by Plasma Treatment and Taguchi Method

This study presents the optimal process parameters of zirconium nitride (ZrN) thin films prepared by ion-assisted deposition (IAD) technology combined with electron-beam evaporation based on plasma surface treatment and the Taguchi method. We use Minitab statistical software (Version 20.2.0) and L9...

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Bibliographic Details
Main Authors: Chuen-Lin Tien, Chun-Yu Chiang, Shih-Chin Lin
Format: Article
Language:English
Published: MDPI AG 2023-08-01
Series:Plasma
Subjects:
zirconium nitride
electron-beam evaporation
ion-assisted deposition
optimization parameters
Online Access:https://www.mdpi.com/2571-6182/6/3/33

Internet

https://www.mdpi.com/2571-6182/6/3/33

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