Electrochemical Properties of Boron-Doped Diamond Electrodes Prepared by Hot Cathode Direct Current Plasma CVD
<p>A series of boron-doped diamond (BDD) films were deposited by using a hot cathode direct current plasma chemical vapor deposition(HCDC-PCVD) system with different ratios of CH<sub>4</sub>/H<sub>2</sub>/B(OCH<sub>3</sub>)<sub>3</sub> (trimethyl...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Kaunas University of Technology
2016-05-01
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| Series: | Medžiagotyra |
| Subjects: | |
| Online Access: | http://matsc.ktu.lt/index.php/MatSc/article/view/12926 |