Critical Pattern Selection Method Based on CNN Embeddings for Full-Chip Optimization
Source mask optimization (SMO), a primary resolution enhancement technology, is one of the most pivotal technologies for enhancing lithography imaging quality. Due to the high computation complexity of SMO, patterns should be selected by a selection algorithm before optimization. However, the limita...
| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2023-10-01
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| Series: | Photonics |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2304-6732/10/11/1186 |