The condition of producing homogeneous nanoscale resistive Ni-Ti films by magnetron sputtering from two sources
The relevance of the work is caused by the necessity to form nanoscale resistive Ni-Ti films with reproducible parameters for being used in measuring devices operating at high temperatures. The main aim of the study is to prove the opportunities, to define the conditions and modes of producing nanos...
| Main Authors: | , |
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| Format: | Article |
| Language: | Russian |
| Published: |
Tomsk Polytechnic University
2019-05-01
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| Series: | Известия Томского политехнического университета: Инжиниринг георесурсов |
| Subjects: | |
| Online Access: | http://izvestiya.tpu.ru/archive/article/view/1438 |