Stencil lithography for bridging MEMS and NEMS

Stencil lithography for bridging MEMS and NEMS

The damage inflicted to silicon nanowires (Si NWs) during the HF vapor etch release poses a challenge to the monolithic integration of Si NWs with higher-order structures, such as microelectromechanical systems (MEMS). This paper reports the development of a stencil lithography-based protection tech...

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Bibliographic Details
Main Authors: Basit Ali, Mehrdad Karimzadehkhouei, Mohammad Nasr Esfahani, Yusuf Leblebici, B. Erdem Alaca
Format: Article
Language:English
Published: Elsevier 2023-06-01
Series:Micro and Nano Engineering
Subjects:
Stencil lithography
MEMS
NEMS
Si nanowires
HF vapor etch
Online Access:http://www.sciencedirect.com/science/article/pii/S2590007223000369

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http://www.sciencedirect.com/science/article/pii/S2590007223000369

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