| Summary: | In interference lithography, 1-dimensional (1D) Fourier series expansion (FSE) technique can be used to create 1D periodic arbitrary patterns. Since the energy of electric field can change the solubility of photoresist, the required electric field intensity to create the desired pattern should be found. Therefore, in this article, an inequality for the magnitude of electric field on the surface of photoresist is addressed. A solution to this equation is provided with one degree of freedom. Intelligent selection of the parameters corresponding to this degree of freedom enhances the performance of the system seriously. The proposed method confirms that our approach can produce subwavelength resolutions. Based on these achievements, we present a new lithography system that can generate 1D periodic arbitrary patterns.
|
|---|