Broadband Polarization Rotator and Splitter Based on 70 nm-Etched Waveguides on SOI Platform
The standard silicon photonic platforms provide three-step silicon etching, i.e., 220 nm for full etching, 70 nm for shallow etching, and 130 nm (or 150 nm) for slab etching. Previously reported mode-evolution-based polarization rotators and splitters (PSRs) usually employ 130 nm-etched slab wavegui...
| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2022-10-01
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| Series: | Photonics |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2304-6732/9/10/758 |