Effects of F3+ ion implantation on the properties of W and W0.5(TaTiVCr)0.5 for depth marker-based plasma erosion analysis
The irradiation resistance of tungsten (W) and a high-entropy alloy-based material W0.5(TaTiVCr)0.5 was analysed using depth marker implantation (F3+ ions irradiation). Mirror-polished W and W0.5(TaTiVCr)0.5 samples were exposed to 5.0 MeV and 4.2 MeV, respectively, F3+ ions up to a maximum fluence...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2020-12-01
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| Series: | Nuclear Materials and Energy |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S235217912030082X |