APA (7th ed.) Citation

Waseem, O. A., Woller, K. B., Sweidan, F. B., & Ryu, H. J. (2020). Effects of F3+ ion implantation on the properties of W and W0.5(TaTiVCr)0.5 for depth marker-based plasma erosion analysis. Elsevier.

Chicago Style (17th ed.) Citation

Waseem, Owais Ahmed, Kevin Benjamin Woller, Faris Bassam Sweidan, and Ho Jin Ryu. Effects of F3+ Ion Implantation on the Properties of W and W0.5(TaTiVCr)0.5 for Depth Marker-based Plasma Erosion Analysis. Elsevier, 2020.

MLA (9th ed.) Citation

Waseem, Owais Ahmed, et al. Effects of F3+ Ion Implantation on the Properties of W and W0.5(TaTiVCr)0.5 for Depth Marker-based Plasma Erosion Analysis. Elsevier, 2020.