Impact of Mechanical Stress and Nitrogen Doping on the Defect Distribution in the Initial Stage of the 4H-SiC PVT Growth Process
Nitrogen incorporation changes the lattice spacing of SiC and can therefore lead to stress during physical vapor transport (PVT). The impact of the nitrogen-doping concentration during the initial phase of PVT growth of 4H-SiC was investigated using molten potassium hydroxide (KOH) etching, and the...
Main Authors: | Johannes Steiner, Peter J. Wellmann |
---|---|
Format: | Article |
Language: | English |
Published: |
MDPI AG
2022-03-01
|
Series: | Materials |
Subjects: | |
Online Access: | https://www.mdpi.com/1996-1944/15/5/1897 |
Similar Items
-
Fabrication of SiC-on-Insulator (SiCOI) Layers by Chemical Vapor Deposition of 3C-SiC on Si-in-Insulator Substrates at Low Deposition Temperatures of 1120 °C
by: Johannes Steiner, et al.
Published: (2023-11-01) -
Contribution of Dislocations in SiC Seed Crystals on the Melt-Back Process in SiC Solution Growth
by: Sakiko Kawanishi, et al.
Published: (2022-02-01) -
SiC Doping Impact during Conducting AFM under Ambient Atmosphere
by: Christina Villeneuve-Faure, et al.
Published: (2023-08-01) -
SiC materials and devices /
by: 378239 Shur, Michael, et al.
Published: (2007) -
Formation of SiC by Vacuum Carbidization on Porous Silicon
by: M. V. Labanok, et al.
Published: (2022-10-01)