FEATURES OF ELECTROCHEMICAL DEPOSITION OF NICKEL IN MESOPOROUS SILICON

Layers of mesoporous Silicon were formed on the surface of monocrystalline silicon wafers by electrochemical anodization in a solution of hydrofluoric acid. Nickel was electrochemically deposited in porous silicon. The dependence of the surface potential of mesoporous Silicon versus Nickel depositio...

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Bibliographic Details
Main Authors: A. L. Dolgiy, S. L. Prischepa, V. A. Petrovich, V. P. Bondarenko
Format: Article
Language:Russian
Published: Educational institution «Belarusian State University of Informatics and Radioelectronics» 2019-06-01
Series:Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki
Subjects:
Online Access:https://doklady.bsuir.by/jour/article/view/850