FEATURES OF ELECTROCHEMICAL DEPOSITION OF NICKEL IN MESOPOROUS SILICON

FEATURES OF ELECTROCHEMICAL DEPOSITION OF NICKEL IN MESOPOROUS SILICON

Layers of mesoporous Silicon were formed on the surface of monocrystalline silicon wafers by electrochemical anodization in a solution of hydrofluoric acid. Nickel was electrochemically deposited in porous silicon. The dependence of the surface potential of mesoporous Silicon versus Nickel depositio...

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Bibliographic Details
Main Authors:	A. L. Dolgiy, S. L. Prischepa, V. A. Petrovich, V. P. Bondarenko
Format:	Article
Language:	Russian
Published:	Educational institution «Belarusian State University of Informatics and Radioelectronics» 2019-06-01
Series:	Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki
Subjects:	электрохимическое анодирование кремния электрохимическое осаждение никеля пористый кремний сканирующая электронная микроскопия
Online Access:	https://doklady.bsuir.by/jour/article/view/850

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