Electrochemical Deposition of CoP and CoNiP as Hard Magnetic Scales in a Position Measurement System
The fabrication and design of hard magnetic materials for micro-electro-mechanical system applications by electrochemical deposition has to consider not only the intrinsic material properties but also the shape anisotropy of the micro-devices. Within the scope of the present work, an as-plated proce...
Main Authors: | , , , , |
---|---|
Format: | Article |
Language: | English |
Published: |
MDPI AG
2022-01-01
|
Series: | Metals |
Subjects: | |
Online Access: | https://www.mdpi.com/2075-4701/12/2/235 |
_version_ | 1797478059062853632 |
---|---|
author | Martin Theis Tobias Bill Heiko Knoll Peter Starke Monika Saumer |
author_facet | Martin Theis Tobias Bill Heiko Knoll Peter Starke Monika Saumer |
author_sort | Martin Theis |
collection | DOAJ |
description | The fabrication and design of hard magnetic materials for micro-electro-mechanical system applications by electrochemical deposition has to consider not only the intrinsic material properties but also the shape anisotropy of the micro-devices. Within the scope of the present work, an as-plated process for hard magnetic Co-based materials was developed, with the products intended to be used as magnetic scales in a positioning system with a resolution within the nanometer range. First, the process–material correlations are investigated in a laboratory-scale process. The CoP and CoNiP show a maximum coercivity of <i>H<sub>C</sub></i> = 28 and 45 kA/m, respectively, as well as maximum remanence polarizations of <i>J<sub>R</sub></i> = 0.65 and 0.40 T, respectively. The CoP process is transferred to a specially developed 20 L plating cell with paddle convection capabilities and a passive bezel to deposit 50 µm wide scales with different thicknesses of up to 55 µm in an integrated process. The in-plane magnetization of the scale bars shows higher remanence polarization than for the out-of-plane direction. Magnetic field-assisted electrochemical deposition promotes the vertical magnetization component resulting in a remanence polarization of 205 mT (out-of-plane) for a scale thickness of 25 µm. |
first_indexed | 2024-03-09T21:26:39Z |
format | Article |
id | doaj.art-83ac5564b92243b49c01d299d1b561f5 |
institution | Directory Open Access Journal |
issn | 2075-4701 |
language | English |
last_indexed | 2024-03-09T21:26:39Z |
publishDate | 2022-01-01 |
publisher | MDPI AG |
record_format | Article |
series | Metals |
spelling | doaj.art-83ac5564b92243b49c01d299d1b561f52023-11-23T21:07:07ZengMDPI AGMetals2075-47012022-01-0112223510.3390/met12020235Electrochemical Deposition of CoP and CoNiP as Hard Magnetic Scales in a Position Measurement SystemMartin Theis0Tobias Bill1Heiko Knoll2Peter Starke3Monika Saumer4Sensitec GmbH, Heiligkreuzweg 109, D-55130 Mainz, GermanyDepartment of Materials Science and Materials Testing (WWHK), University of Applied Sciences Kaiserslautern, Schoenstraße 11, D-67659 Kaiserslautern, GermanySensitec GmbH, Heiligkreuzweg 109, D-55130 Mainz, GermanyDepartment of Materials Science and Materials Testing (WWHK), University of Applied Sciences Kaiserslautern, Schoenstraße 11, D-67659 Kaiserslautern, GermanyDepartment of Microsystems and Information Technologies, University of Applied Sciences Kaiserslautern, Amerikastr. 1, D-66482 Zweibruecken, GermanyThe fabrication and design of hard magnetic materials for micro-electro-mechanical system applications by electrochemical deposition has to consider not only the intrinsic material properties but also the shape anisotropy of the micro-devices. Within the scope of the present work, an as-plated process for hard magnetic Co-based materials was developed, with the products intended to be used as magnetic scales in a positioning system with a resolution within the nanometer range. First, the process–material correlations are investigated in a laboratory-scale process. The CoP and CoNiP show a maximum coercivity of <i>H<sub>C</sub></i> = 28 and 45 kA/m, respectively, as well as maximum remanence polarizations of <i>J<sub>R</sub></i> = 0.65 and 0.40 T, respectively. The CoP process is transferred to a specially developed 20 L plating cell with paddle convection capabilities and a passive bezel to deposit 50 µm wide scales with different thicknesses of up to 55 µm in an integrated process. The in-plane magnetization of the scale bars shows higher remanence polarization than for the out-of-plane direction. Magnetic field-assisted electrochemical deposition promotes the vertical magnetization component resulting in a remanence polarization of 205 mT (out-of-plane) for a scale thickness of 25 µm.https://www.mdpi.com/2075-4701/12/2/235process–material correlationsthick hard magnetselectrochemical depositionintegrated processMEMS |
spellingShingle | Martin Theis Tobias Bill Heiko Knoll Peter Starke Monika Saumer Electrochemical Deposition of CoP and CoNiP as Hard Magnetic Scales in a Position Measurement System Metals process–material correlations thick hard magnets electrochemical deposition integrated process MEMS |
title | Electrochemical Deposition of CoP and CoNiP as Hard Magnetic Scales in a Position Measurement System |
title_full | Electrochemical Deposition of CoP and CoNiP as Hard Magnetic Scales in a Position Measurement System |
title_fullStr | Electrochemical Deposition of CoP and CoNiP as Hard Magnetic Scales in a Position Measurement System |
title_full_unstemmed | Electrochemical Deposition of CoP and CoNiP as Hard Magnetic Scales in a Position Measurement System |
title_short | Electrochemical Deposition of CoP and CoNiP as Hard Magnetic Scales in a Position Measurement System |
title_sort | electrochemical deposition of cop and conip as hard magnetic scales in a position measurement system |
topic | process–material correlations thick hard magnets electrochemical deposition integrated process MEMS |
url | https://www.mdpi.com/2075-4701/12/2/235 |
work_keys_str_mv | AT martintheis electrochemicaldepositionofcopandconipashardmagneticscalesinapositionmeasurementsystem AT tobiasbill electrochemicaldepositionofcopandconipashardmagneticscalesinapositionmeasurementsystem AT heikoknoll electrochemicaldepositionofcopandconipashardmagneticscalesinapositionmeasurementsystem AT peterstarke electrochemicaldepositionofcopandconipashardmagneticscalesinapositionmeasurementsystem AT monikasaumer electrochemicaldepositionofcopandconipashardmagneticscalesinapositionmeasurementsystem |