Electrochemical Deposition of CoP and CoNiP as Hard Magnetic Scales in a Position Measurement System
The fabrication and design of hard magnetic materials for micro-electro-mechanical system applications by electrochemical deposition has to consider not only the intrinsic material properties but also the shape anisotropy of the micro-devices. Within the scope of the present work, an as-plated proce...
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| Format: | Article |
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MDPI AG
2022-01-01
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| Series: | Metals |
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| Online Access: | https://www.mdpi.com/2075-4701/12/2/235 |
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| author | Martin Theis Tobias Bill Heiko Knoll Peter Starke Monika Saumer |
| author_facet | Martin Theis Tobias Bill Heiko Knoll Peter Starke Monika Saumer |
| author_sort | Martin Theis |
| collection | DOAJ |
| description | The fabrication and design of hard magnetic materials for micro-electro-mechanical system applications by electrochemical deposition has to consider not only the intrinsic material properties but also the shape anisotropy of the micro-devices. Within the scope of the present work, an as-plated process for hard magnetic Co-based materials was developed, with the products intended to be used as magnetic scales in a positioning system with a resolution within the nanometer range. First, the process–material correlations are investigated in a laboratory-scale process. The CoP and CoNiP show a maximum coercivity of <i>H<sub>C</sub></i> = 28 and 45 kA/m, respectively, as well as maximum remanence polarizations of <i>J<sub>R</sub></i> = 0.65 and 0.40 T, respectively. The CoP process is transferred to a specially developed 20 L plating cell with paddle convection capabilities and a passive bezel to deposit 50 µm wide scales with different thicknesses of up to 55 µm in an integrated process. The in-plane magnetization of the scale bars shows higher remanence polarization than for the out-of-plane direction. Magnetic field-assisted electrochemical deposition promotes the vertical magnetization component resulting in a remanence polarization of 205 mT (out-of-plane) for a scale thickness of 25 µm. |
| first_indexed | 2024-03-09T21:26:39Z |
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| id | doaj.art-83ac5564b92243b49c01d299d1b561f5 |
| institution | Directory Open Access Journal |
| issn | 2075-4701 |
| language | English |
| last_indexed | 2024-03-09T21:26:39Z |
| publishDate | 2022-01-01 |
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| spelling | doaj.art-83ac5564b92243b49c01d299d1b561f52023-11-23T21:07:07ZengMDPI AGMetals2075-47012022-01-0112223510.3390/met12020235Electrochemical Deposition of CoP and CoNiP as Hard Magnetic Scales in a Position Measurement SystemMartin Theis0Tobias Bill1Heiko Knoll2Peter Starke3Monika Saumer4Sensitec GmbH, Heiligkreuzweg 109, D-55130 Mainz, GermanyDepartment of Materials Science and Materials Testing (WWHK), University of Applied Sciences Kaiserslautern, Schoenstraße 11, D-67659 Kaiserslautern, GermanySensitec GmbH, Heiligkreuzweg 109, D-55130 Mainz, GermanyDepartment of Materials Science and Materials Testing (WWHK), University of Applied Sciences Kaiserslautern, Schoenstraße 11, D-67659 Kaiserslautern, GermanyDepartment of Microsystems and Information Technologies, University of Applied Sciences Kaiserslautern, Amerikastr. 1, D-66482 Zweibruecken, GermanyThe fabrication and design of hard magnetic materials for micro-electro-mechanical system applications by electrochemical deposition has to consider not only the intrinsic material properties but also the shape anisotropy of the micro-devices. Within the scope of the present work, an as-plated process for hard magnetic Co-based materials was developed, with the products intended to be used as magnetic scales in a positioning system with a resolution within the nanometer range. First, the process–material correlations are investigated in a laboratory-scale process. The CoP and CoNiP show a maximum coercivity of <i>H<sub>C</sub></i> = 28 and 45 kA/m, respectively, as well as maximum remanence polarizations of <i>J<sub>R</sub></i> = 0.65 and 0.40 T, respectively. The CoP process is transferred to a specially developed 20 L plating cell with paddle convection capabilities and a passive bezel to deposit 50 µm wide scales with different thicknesses of up to 55 µm in an integrated process. The in-plane magnetization of the scale bars shows higher remanence polarization than for the out-of-plane direction. Magnetic field-assisted electrochemical deposition promotes the vertical magnetization component resulting in a remanence polarization of 205 mT (out-of-plane) for a scale thickness of 25 µm.https://www.mdpi.com/2075-4701/12/2/235process–material correlationsthick hard magnetselectrochemical depositionintegrated processMEMS |
| spellingShingle | Martin Theis Tobias Bill Heiko Knoll Peter Starke Monika Saumer Electrochemical Deposition of CoP and CoNiP as Hard Magnetic Scales in a Position Measurement System Metals process–material correlations thick hard magnets electrochemical deposition integrated process MEMS |
| title | Electrochemical Deposition of CoP and CoNiP as Hard Magnetic Scales in a Position Measurement System |
| title_full | Electrochemical Deposition of CoP and CoNiP as Hard Magnetic Scales in a Position Measurement System |
| title_fullStr | Electrochemical Deposition of CoP and CoNiP as Hard Magnetic Scales in a Position Measurement System |
| title_full_unstemmed | Electrochemical Deposition of CoP and CoNiP as Hard Magnetic Scales in a Position Measurement System |
| title_short | Electrochemical Deposition of CoP and CoNiP as Hard Magnetic Scales in a Position Measurement System |
| title_sort | electrochemical deposition of cop and conip as hard magnetic scales in a position measurement system |
| topic | process–material correlations thick hard magnets electrochemical deposition integrated process MEMS |
| url | https://www.mdpi.com/2075-4701/12/2/235 |
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