Morphological Control of a Tribo-Nanolithography-Induced Amorphous Silicon Phase for Three-Dimensional Lithography

Morphological Control of a Tribo-Nanolithography-Induced Amorphous Silicon Phase for Three-Dimensional Lithography

This study sought to fabricate a three-dimensional structure on a silicon surface using a combination of tribo-nanolithography (TNL) and wet chemical etching. TNL forms an amorphous phase on a single-crystal silicon surface that has an etch resistance against potassium hydroxide (KOH). A protruding...

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Bibliographic Details
Main Authors: Noritaka KAWASEGI, Noboru MORITA, Shigeru YAMADA, Noboru TAKANO, Tatsuo OYAMA, Kiwamu ASHIDA
Format: Article
Language:English
Published: The Japan Society of Mechanical Engineers 2007-05-01
Series:Journal of Advanced Mechanical Design, Systems, and Manufacturing
Subjects:
tribo-nanolithography
three-dimensional nanofabrication
maskless patterning
nanomachining
atomic force microscope
wet chemical etching
cantilever for machining
single crystal silicon
Online Access:https://www.jstage.jst.go.jp/article/jamdsm/1/3/1_3_283/_pdf/-char/en

Internet

https://www.jstage.jst.go.jp/article/jamdsm/1/3/1_3_283/_pdf/-char/en

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