Sputter grown CuO thin films: Impact of growth pressure and annealing temperature on their microstructural architectures

Sputter grown CuO thin films: Impact of growth pressure and annealing temperature on their microstructural architectures

High-quality copper oxide (CuO) thin films were deposited on the silicon (Si) substrate at the room temperature using the physical vapour deposition (PVD) technique named radio frequency (RF) sputtering. The copper-oxide thin-films were single crystalline and of uniform thickness. Subsequently, the...

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Bibliographic Details
Main Authors: Ambati Mounika Sai Krishna, Kumar Babu Busi, Brindha Ramasubramanian, Vundrala Sumedha Reddy, Aniket Samanta, Seeram Ramakrishna, Siddhartha Ghosh, Sabyasachi Chakrabortty, Goutam Kumar Dalapati
Format: Article
Language:English
Published: Elsevier 2024-04-01
Series:Memories - Materials, Devices, Circuits and Systems
Subjects:
CuO thin films
RF sputtering
Post annealing
Crystalline size
Stress and strain
Surface roughness
Online Access:http://www.sciencedirect.com/science/article/pii/S2773064624000021

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http://www.sciencedirect.com/science/article/pii/S2773064624000021

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