Controlled Surface Morphology and Electrical Properties of Sputtered Titanium Nitride Thin Film for Metal–Insulator–Metal Structures

Controlled Surface Morphology and Electrical Properties of Sputtered Titanium Nitride Thin Film for Metal–Insulator–Metal Structures

Titanium nitride (TiN) is a material of interest for electrodes owing to its high-temperature stability, robustness, low-cost, and suitable electrical properties. Herein, we studied the surface morphology and electrical properties of TiN thin film deposited onto an Si/SiO<sub>2</sub> <...

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Bibliographic Details
Main Authors: Viet Dongquoc, Dong-Bum Seo, Cao Viet Anh, Jae-Hyun Lee, Jun-Hong Park, Eui-Tae Kim
Format: Article
Language:English
Published: MDPI AG 2022-10-01
Series:Applied Sciences
Subjects:
titanium nitride
thin film
surface roughness
electrical properties
magnetron sputtering
Online Access:https://www.mdpi.com/2076-3417/12/20/10415

Internet

https://www.mdpi.com/2076-3417/12/20/10415

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