High crystalline epitaxial thin films of NiO by plasma-enhanced ALD and their properties
NiO is an interesting transition metal oxide due to its fascinating properties. High crystalline thin films of NiO are preferred for use in a variety of device applications but are challenging to deposit at low temperatures. We have prepared epitaxial thin films of NiO with [111] as the preferred gr...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2023-09-01
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| Series: | APL Materials |
| Online Access: | http://dx.doi.org/10.1063/5.0157628 |