Annealing Temperature Effect on the Physical Properties of NiO Thin Films Grown by DC Magnetron Sputtering

Annealing Temperature Effect on the Physical Properties of NiO Thin Films Grown by DC Magnetron Sputtering

Abstract Nickel oxide is a promising material for transparent electronics applications. This semiconductor demonstrates the possibility of modifying its physical properties depending on the method of growth and subsequent processing. Here the effects of the discharge power are reported during reacti...

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Bibliographic Details
Main Authors: Sergei Timoshnev, Alexey Kazakin, Ksenia Shubina, Valentina Andreeva, Elizaveta Fedorenko, Aleksandra Koroleva, Evgeniy Zhizhin, Olga Koval, Alina Kurinnaya, Alexander Shalin, Vjaceslavs Bobrovs, Yakov Enns
Format: Article
Language:English
Published: Wiley-VCH 2024-03-01
Series:Advanced Materials Interfaces
Subjects:
DC magnetron sputtering
electrical conductivity
NiO thin films
oxides
X‐ray photoelectron spectroscopy
Online Access:https://doi.org/10.1002/admi.202300815

Internet

https://doi.org/10.1002/admi.202300815

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