Role of Ambient Hydrogen in HiPIMS-ITO Film during Annealing Process in a Large Temperature Range

Indium tin oxide (ITO) thin films were prepared by high power impulse magnetron sputtering (HiPIMS) and annealed in hydrogen-containing forming gas to reduce the film resistivity. The film resistivity reduces by nearly an order of magnitude from 5.6 × 10<sup>−3</sup> Ω·cm for the as-depo...

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Bibliographic Details
Main Authors: Ming-Jie Zhao, Jin-Fa Zhang, Jie Huang, Zuo-Zhu Chen, An Xie, Wan-Yu Wu, Chien-Jung Huang, Dong-Sing Wuu, Shui-Yang Lien, Wen-Zhang Zhu
Format: Article
Language:English
Published: MDPI AG 2022-06-01
Series:Nanomaterials
Subjects:
Online Access:https://www.mdpi.com/2079-4991/12/12/1995