Suppressing the Photocatalytic Activity of TiO2 Nanoparticles by Extremely Thin Al2O3 Films Grown by Gas-Phase Deposition at Ambient Conditions

Suppressing the Photocatalytic Activity of TiO2 Nanoparticles by Extremely Thin Al2O3 Films Grown by Gas-Phase Deposition at Ambient Conditions

This work investigated the suppression of photocatalytic activity of titanium dioxide (TiO2) pigment powders by extremely thin aluminum oxide (Al2O3) films deposited via an atomic-layer-deposition-type process using trimethylaluminum (TMA) and H2O as precursors. The deposition was performed on multi...

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Bibliographic Details
Main Authors: Jing Guo, Hao Van Bui, David Valdesueiro, Shaojun Yuan, Bin Liang, J. Ruud van Ommen
Format: Article
Language:English
Published: MDPI AG 2018-01-01
Series:Nanomaterials
Subjects:
ultrathin Al2O3 films
atomic layer deposition
fluidized bed reactor
photocatalytic suppression
TiO2 pigments
Online Access:http://www.mdpi.com/2079-4991/8/2/61

Internet

http://www.mdpi.com/2079-4991/8/2/61

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