Reactive Ion Etching of X-Cut LiNbO<sub>3</sub> in an ICP/TCP System for the Fabrication of an Optical Ridge Waveguide

Reactive Ion Etching of X-Cut LiNbO<sub>3</sub> in an ICP/TCP System for the Fabrication of an Optical Ridge Waveguide

In this study, the technology for producing ridge waveguides with a minimal roughness of the sidewalls and material surface in a near-waveguide region was developed with the purpose of fabricating miniature photonic integrated circuits on a LiNbO<sub>3</sub> substrate. Plasma etching pro...

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Bibliographic Details
Main Authors: Andrei Kozlov, Dmitrii Moskalev, Uliana Salgaeva, Anna Bulatova, Victor Krishtop, Anatolii Volyntsev, Alexander Syuy
Format: Article
Language:English
Published: MDPI AG 2023-02-01
Series:Applied Sciences
Subjects:
lithium niobate
ridge waveguides
reactive ion etching
Online Access:https://www.mdpi.com/2076-3417/13/4/2097

Internet

https://www.mdpi.com/2076-3417/13/4/2097

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