High Current Density Vertical Nanowire TFETs With I&#x2086;&#x2080; &#x003E; 1 <italic>&#x03BC;</italic>A/<italic>&#x03BC;</italic>m

We present experimental data for a vertical, 22-nm-diameter InAs/(In)GaAsSb nanowire Tunnel Field-Effect Transistor that exhibits the highest reported I60 of <inline-formula> <tex-math notation="LaTeX">$1.2~\mu \text{A}/\mu \text{m}$ </tex-math></inline-formula>, pa...

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Bibliographic Details
Main Authors: Gautham Rangasamy, Zhongyunshen Zhu, Lars-Erik Wernersson
Format: Article
Language:English
Published: IEEE 2023-01-01
Series:IEEE Access
Subjects:
Online Access:https://ieeexplore.ieee.org/document/10234407/
Description
Summary:We present experimental data for a vertical, 22-nm-diameter InAs/(In)GaAsSb nanowire Tunnel Field-Effect Transistor that exhibits the highest reported I60 of <inline-formula> <tex-math notation="LaTeX">$1.2~\mu \text{A}/\mu \text{m}$ </tex-math></inline-formula>, paving the way for low power applications. The transistor reaches a minimum subthreshold swing of 43 mV/dec at <inline-formula> <tex-math notation="LaTeX">$\text{V}_{DS}$ </tex-math></inline-formula> &#x003D; 300 mV with a sub-60 mV/dec operation over a wide current range. Combined with a high transconductance of <inline-formula> <tex-math notation="LaTeX">$205~\mu \text{S}/\mu \text{m}$ </tex-math></inline-formula>, the ON-current for the same device is <inline-formula> <tex-math notation="LaTeX">$18.6~\mu \text{A}/\mu \text{m}$ </tex-math></inline-formula> at <inline-formula> <tex-math notation="LaTeX">$\text{V}_{DS}$ </tex-math></inline-formula> &#x003D; 300 mV for <inline-formula> <tex-math notation="LaTeX">$\text{I}_{OFF}$ </tex-math></inline-formula> of 1 nA/<inline-formula> <tex-math notation="LaTeX">$\mu \text{m}$ </tex-math></inline-formula>.
ISSN:2169-3536