Preparation and growth mechanism of ultra-thin free-standing polycrystalline diamond film based on glass carbon substrate
In these experiments, Ti, Si and glass carbon substrates were selected to prepare ultra-thin polycrystalline diamond films by microwave plasma chemical vapor deposition (MPCVD) using CH4/H2 as the reaction source. The overall morphology, surface morphology, composition and stress state of the prepar...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | zho |
| Published: |
Zhengzhou Research Institute for Abrasives & Grinding Co., Ltd.
2023-10-01
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| Series: | Jin'gangshi yu moliao moju gongcheng |
| Subjects: | |
| Online Access: | http://www.jgszz.cn/article/doi/10.13394/j.cnki.jgszz.2023.0005 |
| _version_ | 1797392206813724672 |
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| author | Xiao XIONG Bing WANG Ying XIONG Guodong WU |
| author_facet | Xiao XIONG Bing WANG Ying XIONG Guodong WU |
| author_sort | Xiao XIONG |
| collection | DOAJ |
| description | In these experiments, Ti, Si and glass carbon substrates were selected to prepare ultra-thin polycrystalline diamond films by microwave plasma chemical vapor deposition (MPCVD) using CH4/H2 as the reaction source. The overall morphology, surface morphology, composition and stress state of the prepared diamond films were characterized and analyzed by SEM, Raman and a profilometer. The results show that only diamond films grown on glass carbon substrate can be automatically peeled off to form a complete free-standing film. The crystal surface of the film grains is clear, and the film thickness is only 10 μm. Raman spectra reveal that thin films have strong sharp diamond characteristic peaks, and that the calculated residual stress is the lowest, which is −0.2161 GPa. It is expected to provide an effective new technique for the one-step growth and stripping of ultra-thin self-supported CVD diamond films. |
| first_indexed | 2024-03-08T23:43:50Z |
| format | Article |
| id | doaj.art-8a54817430e84f54b617819b09c828c1 |
| institution | Directory Open Access Journal |
| issn | 1006-852X |
| language | zho |
| last_indexed | 2024-03-08T23:43:50Z |
| publishDate | 2023-10-01 |
| publisher | Zhengzhou Research Institute for Abrasives & Grinding Co., Ltd. |
| record_format | Article |
| series | Jin'gangshi yu moliao moju gongcheng |
| spelling | doaj.art-8a54817430e84f54b617819b09c828c12023-12-14T03:37:28ZzhoZhengzhou Research Institute for Abrasives & Grinding Co., Ltd.Jin'gangshi yu moliao moju gongcheng1006-852X2023-10-0143553153610.13394/j.cnki.jgszz.2023.00052023-0005Preparation and growth mechanism of ultra-thin free-standing polycrystalline diamond film based on glass carbon substrateXiao XIONG0Bing WANG1Ying XIONG2Guodong WU3School of Materials Science & Engineering, Southwest University of Science & Technology, Mianyang 621010, Sichuan, ChinaSchool of Materials Science & Engineering, Southwest University of Science & Technology, Mianyang 621010, Sichuan, ChinaSchool of Materials Science & Engineering, Southwest University of Science & Technology, Mianyang 621010, Sichuan, ChinaSchool of Materials Science & Engineering, Southwest University of Science & Technology, Mianyang 621010, Sichuan, ChinaIn these experiments, Ti, Si and glass carbon substrates were selected to prepare ultra-thin polycrystalline diamond films by microwave plasma chemical vapor deposition (MPCVD) using CH4/H2 as the reaction source. The overall morphology, surface morphology, composition and stress state of the prepared diamond films were characterized and analyzed by SEM, Raman and a profilometer. The results show that only diamond films grown on glass carbon substrate can be automatically peeled off to form a complete free-standing film. The crystal surface of the film grains is clear, and the film thickness is only 10 μm. Raman spectra reveal that thin films have strong sharp diamond characteristic peaks, and that the calculated residual stress is the lowest, which is −0.2161 GPa. It is expected to provide an effective new technique for the one-step growth and stripping of ultra-thin self-supported CVD diamond films.http://www.jgszz.cn/article/doi/10.13394/j.cnki.jgszz.2023.0005ultra-thin diamond filmfree-standingglass carbon substratefilm-substrate separationgrowth mechanismmpcvd |
| spellingShingle | Xiao XIONG Bing WANG Ying XIONG Guodong WU Preparation and growth mechanism of ultra-thin free-standing polycrystalline diamond film based on glass carbon substrate Jin'gangshi yu moliao moju gongcheng ultra-thin diamond film free-standing glass carbon substrate film-substrate separation growth mechanism mpcvd |
| title | Preparation and growth mechanism of ultra-thin free-standing polycrystalline diamond film based on glass carbon substrate |
| title_full | Preparation and growth mechanism of ultra-thin free-standing polycrystalline diamond film based on glass carbon substrate |
| title_fullStr | Preparation and growth mechanism of ultra-thin free-standing polycrystalline diamond film based on glass carbon substrate |
| title_full_unstemmed | Preparation and growth mechanism of ultra-thin free-standing polycrystalline diamond film based on glass carbon substrate |
| title_short | Preparation and growth mechanism of ultra-thin free-standing polycrystalline diamond film based on glass carbon substrate |
| title_sort | preparation and growth mechanism of ultra thin free standing polycrystalline diamond film based on glass carbon substrate |
| topic | ultra-thin diamond film free-standing glass carbon substrate film-substrate separation growth mechanism mpcvd |
| url | http://www.jgszz.cn/article/doi/10.13394/j.cnki.jgszz.2023.0005 |
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