Two-dimensional material-assisted remote epitaxy and van der Waals epitaxy: a review
Heteroepitaxy can reduce the cost and widen the application range of semiconductor film synthesis and device fabrication. However, the lattice and thermal expansion coefficient mismatches between epilayers and substrates limit the improvement of crystal quality and device performance. Two-dimensiona...
| Main Authors: | , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Science Press
2023-07-01
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| Series: | National Science Open |
| Subjects: | |
| Online Access: | https://www.sciengine.com/doi/10.1360/nso/20220068 |