EUV Lithography: State-of-the-Art Review

EUV Lithography: State-of-the-Art Review

Although several years delayed than its initial plan, extreme UV lithography (EUVL) with 13.5nm wavelength has been finally implemented into high volume manufacture (HVM) of mainstream semiconductor industry since 2018. With the delivery and installation of ASML EUV scanners in those giant Fab playe...

पूर्ण विवरण

ग्रंथसूची विवरण
मुख्य लेखकों: Nan Fu, Yanxiang Liu, Xiaolong Ma, Zanfeng Chen
स्वरूप: लेख
भाषा:English
प्रकाशित: JommPublish 2019-06-01
श्रृंखला:Journal of Microelectronic Manufacturing
विषय:
euv lithography
euv review
mask 3d
line edge roughness
euv light source
ऑनलाइन पहुंच:http://www.jommpublish.org/p/29/#

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http://www.jommpublish.org/p/29/#

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