Phase Mask Pinholes as Spatial Filters for Laser Interference Lithography
Laser resonators have outputs with Gaussian spatial beam profiles. In laser interference lithography (LIL), using such Gaussian‐shaped beams leads to an inhomogeneous exposure of the substrate. As a result, dimensions of lithography‐defined features vary significantly across the substrate. In most L...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Wiley-VCH
2023-10-01
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| Series: | Advanced Photonics Research |
| Subjects: | |
| Online Access: | https://doi.org/10.1002/adpr.202300225 |