Investigating Benzoic Acid Derivatives as Potential Atomic Layer Deposition Inhibitors Using Nanoscale Infrared Spectroscopy

Investigating Benzoic Acid Derivatives as Potential Atomic Layer Deposition Inhibitors Using Nanoscale Infrared Spectroscopy

Area-selective atomic layer deposition (AS-ALD) is a technique utilized for the fabrication of patterned thin films in the semiconductor industry due to its capability to produce uniform and conformal structures with control over thickness at the atomic scale level. In AS-ALD, surfaces are functiona...

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Bibliographic Details
Main Authors: Saumya Satyarthy, Mark Cheng, Ayanjeet Ghosh
Format: Article
Language:English
Published: MDPI AG 2025-01-01
Series:Nanomaterials
Subjects:
atomic layer deposition
self-assembled monolayers
atomic force microscopy-infrared spectroscopy
carboxylic acid inhibitors
zinc oxide deposition
surface chemistry and coordination
Online Access:https://www.mdpi.com/2079-4991/15/3/164

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https://www.mdpi.com/2079-4991/15/3/164

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