PREPARATION AND OPTICAL PROPERTIES OF NANOSTRUCTURED ANTIREFLECTIVE LAYERS FOR Si-PHOTODEVICES

The layers of nanoporous silicon are formed by using the method of electrochemical anodization on the surface of silicon polished wafers with the surface highly-doped n+ layer. The layers were fabricated at the constant direct current using the anodization process and at the current, which varies ac...

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Bibliographic Details
Main Authors: T. I. Taubayev, V. E. Nikulin, Ye. T. Taubayev, K. K. Dikhanbayev
Format: Article
Language:English
Published: Al-Farabi Kazakh National University 2009-12-01
Series:Вестник. Серия физическая
Online Access:https://bph.kaznu.kz/index.php/zhuzhu/article/view/229