Mist-CVD-derived Hf0.55Zr0.45O2 ferroelectric thin films post-annealed by rapid thermal annealing
We have newly applied Rapid Thermal Annealing (RTA) for the post-annealing of mist chemical-vapor-deposition (CVD)-derived Hf1−xZrxO2 (HZO) thin films. A ferroelectric polarization-electric field (P–E) curve was confirmed typically with noticeable polarization reversal currents. These ferroelectric...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2023-01-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/5.0134375 |