Optimizing PMMA solutions to suppress contamination in the transfer of CVD graphene for batch production

Optimizing PMMA solutions to suppress contamination in the transfer of CVD graphene for batch production

Mass production and commercial adoption of graphene-based devices are held back by a few crucial technical challenges related to quality control. In the case of graphene produced by chemical vapor deposition, the transfer process represents a delicate step that can compromise device performance and...

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Bibliographic Details
Main Authors: Chun-Da Liao, Andrea Capasso, Tiago Queirós, Telma Domingues, Fatima Cerqueira, Nicoleta Nicoara, Jérôme Borme, Paulo Freitas, Pedro Alpuim
Format: Article
Language:English
Published: Beilstein-Institut 2022-08-01
Series:Beilstein Journal of Nanotechnology
Subjects:
2d materials
graphene transfer process
large-scale fabrication
microelectronics
poly(methyl methacrylate)
Online Access:https://doi.org/10.3762/bjnano.13.70

Internet

https://doi.org/10.3762/bjnano.13.70

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