Scanning transmission electron microscopy investigations of self-forming diffusion barrier formation in Cu(Mn) alloys on SiO2

Scanning transmission electron microscopy investigations of self-forming diffusion barrier formation in Cu(Mn) alloys on SiO2

Scanning transmission electron microscopy in high angle annular dark field mode has been used to undertake a characterisation study with sub-nanometric spatial resolution of the barrier formation process for a Cu(Mn) alloy (90%/10%) deposited on SiO2. Electron energy loss spectroscopy (EELS) measure...

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Bibliographic Details
Main Authors: J. G. Lozano, J. Bogan, P. Casey, A. P. McCoy, G. Hughes, P. D. Nellist
Format: Article
Language:English
Published: AIP Publishing LLC 2013-10-01
Series:APL Materials
Online Access:http://dx.doi.org/10.1063/1.4822441

Internet

http://dx.doi.org/10.1063/1.4822441

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