Laboratory X-ray Microscopy of 3D Nanostructures in the Hard X-ray Regime Enabled by a Combination of Multilayer X-ray Optics
High-resolution imaging of buried metal interconnect structures in advanced microelectronic products with full-field X-ray microscopy is demonstrated in the hard X-ray regime, i.e., at photon energies > 10 keV. The combination of two multilayer optics—a side-by-side Montel (or nested Kirkpatrick–...
Principais autores: | , , , , , , |
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Formato: | Artigo |
Idioma: | English |
Publicado em: |
MDPI AG
2024-01-01
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coleção: | Nanomaterials |
Assuntos: | |
Acesso em linha: | https://www.mdpi.com/2079-4991/14/2/233 |