Laboratory X-ray Microscopy of 3D Nanostructures in the Hard X-ray Regime Enabled by a Combination of Multilayer X-ray Optics

High-resolution imaging of buried metal interconnect structures in advanced microelectronic products with full-field X-ray microscopy is demonstrated in the hard X-ray regime, i.e., at photon energies > 10 keV. The combination of two multilayer optics—a side-by-side Montel (or nested Kirkpatrick–...

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Detalhes bibliográficos
Principais autores: Bartlomiej Lechowski, Kristina Kutukova, Joerg Grenzer, Iuliana Panchenko, Peter Krueger, Andre Clausner, Ehrenfried Zschech
Formato: Artigo
Idioma:English
Publicado em: MDPI AG 2024-01-01
coleção:Nanomaterials
Assuntos:
Acesso em linha:https://www.mdpi.com/2079-4991/14/2/233