Laboratory X-ray Microscopy of 3D Nanostructures in the Hard X-ray Regime Enabled by a Combination of Multilayer X-ray Optics
High-resolution imaging of buried metal interconnect structures in advanced microelectronic products with full-field X-ray microscopy is demonstrated in the hard X-ray regime, i.e., at photon energies > 10 keV. The combination of two multilayer optics—a side-by-side Montel (or nested Kirkpatrick–...
Main Authors: | Bartlomiej Lechowski, Kristina Kutukova, Joerg Grenzer, Iuliana Panchenko, Peter Krueger, Andre Clausner, Ehrenfried Zschech |
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Format: | Article |
Language: | English |
Published: |
MDPI AG
2024-01-01
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Series: | Nanomaterials |
Subjects: | |
Online Access: | https://www.mdpi.com/2079-4991/14/2/233 |
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