Influence of vacuum-plasma treatment modes on the surface photo-EMF of single-crystal silicon
Plasma technologies in the last quarter of the twentieth century made a real scientific and technological revolution in microelectronics. Having come to the world of microelectronics technology as a necessary alternative to liquid etching, which had exhausted its resource by that time, plasma or «d...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | Russian |
| Published: |
Tver State University
2022-12-01
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| Series: | Физико-химические аспекты изучения кластеров, наноструктур и наноматериалов |
| Subjects: | |
| Online Access: | https://physchemaspects.ru/2022/doi-10-26456-pcascnn-2022-14-671/?lang=en |