Low-Temperature and High-Speed Fabrication of Nanocrystalline Ge Films on Cu Substrates Using Sub-Torr-Pressure Plasma Sputtering

Low-Temperature and High-Speed Fabrication of Nanocrystalline Ge Films on Cu Substrates Using Sub-Torr-Pressure Plasma Sputtering

We fabricated nanocrystalline Ge films using radio-frequency (RF) magnetron plasma sputtering deposition under a high Ar-gas pressure. The Ge nanograins changed from amorphous to crystalline when the distance between the Ge sputtering target and the substrate was decreased to 5 mm and the RF input p...

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Bibliographic Details
Main Authors: Giichiro Uchida, Kenta Nagai, Ayaka Wakana, Yumiko Ikebe
Format: Article
Language:English
Published: IEEE 2022-01-01
Series:IEEE Open Journal of Nanotechnology
Subjects:
Plasma applications
plasma control
semiconductor films
sputtering
germanium
germanium alloys
Online Access:https://ieeexplore.ieee.org/document/9946384/

Internet

https://ieeexplore.ieee.org/document/9946384/

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