Influence of water contamination on the sputtering of silicon with low-energy argon ions investigated by molecular dynamics simulations
Focused ion beams (FIB) are a common tool in nanotechnology for surface analysis, sample preparation for electron microscopy and atom probe tomography, surface patterning, nanolithography, nanomachining, and nanoprinting. For many of these applications, a precise control of ion-beam-induced processe...
Main Authors: | , , |
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Format: | Article |
Language: | English |
Published: |
Beilstein-Institut
2022-09-01
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Series: | Beilstein Journal of Nanotechnology |
Subjects: | |
Online Access: | https://doi.org/10.3762/bjnano.13.86 |