Influence of water contamination on the sputtering of silicon with low-energy argon ions investigated by molecular dynamics simulations

Influence of water contamination on the sputtering of silicon with low-energy argon ions investigated by molecular dynamics simulations

Focused ion beams (FIB) are a common tool in nanotechnology for surface analysis, sample preparation for electron microscopy and atom probe tomography, surface patterning, nanolithography, nanomachining, and nanoprinting. For many of these applications, a precise control of ion-beam-induced processe...

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Bibliographic Details
Main Authors: Grégoire R. N. Defoort-Levkov, Alan Bahm, Patrick Philipp
Format: Article
Language:English
Published: Beilstein-Institut 2022-09-01
Series:Beilstein Journal of Nanotechnology
Subjects:
angle dependency
argon ions
contamination
focused ion beams
ion bombardment
low energy
molecular dynamics
silicon
simulations
water
Online Access:https://doi.org/10.3762/bjnano.13.86

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