Growth Temperature Effect of Atomic-Layer-Deposited GdOx Films
Gadolinium oxide (Gd2O3) is one of the lanthanide rare-earth oxides, which has been extensively studied due to its versatile functionalities, such as a high permittivity, reactivity with moisture, and ionic conductivity, etc. In this work, GdOx thin film was grown by atomic layer deposition using cy...
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| Format: | Article |
| Language: | English |
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Polish Academy of Sciences
2021-09-01
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| Series: | Archives of Metallurgy and Materials |
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| Online Access: | https://journals.pan.pl/Content/119248/PDF/AMM-2021-3-17-Byung%20Joon%20Choi.pdf |
| _version_ | 1811314023554088960 |
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| author | Sung Yeon Ryu Hee Ju Yun Min Hwan Lee Byung Joon Choi |
| author_facet | Sung Yeon Ryu Hee Ju Yun Min Hwan Lee Byung Joon Choi |
| author_sort | Sung Yeon Ryu |
| collection | DOAJ |
| description | Gadolinium oxide (Gd2O3) is one of the lanthanide rare-earth oxides, which has been extensively studied due to its versatile functionalities, such as a high permittivity, reactivity with moisture, and ionic conductivity, etc. In this work, GdOx thin film was grown by atomic layer deposition using cyclopentadienyl (Cp)-based Gd precursor and water. As-grown GdOx film was amorphous and had a sub-stoichiometric (x ~ 1.2) composition with a uniform elemental depth profile. ~3 nm-thick GdOx thin film could modify the hydrophilic Si substrate into hydrophobic surface with water wetting angle of 70°. Wetting and electrical test revealed that the growth temperature affects the hydrophobicity and electrical strength of the as-grown GdOx film. |
| first_indexed | 2024-04-13T11:04:40Z |
| format | Article |
| id | doaj.art-919e40078c414600bb6f9dcb378ac66e |
| institution | Directory Open Access Journal |
| issn | 2300-1909 |
| language | English |
| last_indexed | 2024-04-13T11:04:40Z |
| publishDate | 2021-09-01 |
| publisher | Polish Academy of Sciences |
| record_format | Article |
| series | Archives of Metallurgy and Materials |
| spelling | doaj.art-919e40078c414600bb6f9dcb378ac66e2022-12-22T02:49:18ZengPolish Academy of SciencesArchives of Metallurgy and Materials2300-19092021-09-01vol. 66No 3755758https://doi.org/10.24425/amm.2021.136375Growth Temperature Effect of Atomic-Layer-Deposited GdOx FilmsSung Yeon Ryu0Hee Ju Yun1Min Hwan Lee2Byung Joon Choi3https://orcid.org/0000-0003-1920-8162Seoul National University of Science and Technology, Department of Material Science and Engineering, Seoul 01811, KoreaSeoul National University of Science and Technology, Department of Material Science and Engineering, Seoul 01811, KoreaUniversity of California Merced, Department of Mechanical Engineering, Merced, California, USASeoul National University of Science and Technology, Department of Material Science and Engineering, Seoul 01811, KoreaGadolinium oxide (Gd2O3) is one of the lanthanide rare-earth oxides, which has been extensively studied due to its versatile functionalities, such as a high permittivity, reactivity with moisture, and ionic conductivity, etc. In this work, GdOx thin film was grown by atomic layer deposition using cyclopentadienyl (Cp)-based Gd precursor and water. As-grown GdOx film was amorphous and had a sub-stoichiometric (x ~ 1.2) composition with a uniform elemental depth profile. ~3 nm-thick GdOx thin film could modify the hydrophilic Si substrate into hydrophobic surface with water wetting angle of 70°. Wetting and electrical test revealed that the growth temperature affects the hydrophobicity and electrical strength of the as-grown GdOx film.https://journals.pan.pl/Content/119248/PDF/AMM-2021-3-17-Byung%20Joon%20Choi.pdfgadolinium oxide (gd2o3)rare-earth oxideatomic layer depositionhydrophobicityelectrical property |
| spellingShingle | Sung Yeon Ryu Hee Ju Yun Min Hwan Lee Byung Joon Choi Growth Temperature Effect of Atomic-Layer-Deposited GdOx Films Archives of Metallurgy and Materials gadolinium oxide (gd2o3) rare-earth oxide atomic layer deposition hydrophobicity electrical property |
| title | Growth Temperature Effect of Atomic-Layer-Deposited GdOx Films |
| title_full | Growth Temperature Effect of Atomic-Layer-Deposited GdOx Films |
| title_fullStr | Growth Temperature Effect of Atomic-Layer-Deposited GdOx Films |
| title_full_unstemmed | Growth Temperature Effect of Atomic-Layer-Deposited GdOx Films |
| title_short | Growth Temperature Effect of Atomic-Layer-Deposited GdOx Films |
| title_sort | growth temperature effect of atomic layer deposited gdox films |
| topic | gadolinium oxide (gd2o3) rare-earth oxide atomic layer deposition hydrophobicity electrical property |
| url | https://journals.pan.pl/Content/119248/PDF/AMM-2021-3-17-Byung%20Joon%20Choi.pdf |
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