Distortion Detection of Lithographic Projection Lenses Based on Wavefront Measurement
As with the decreasing feature size prompted by Moore’s law and the continuous technological advancements in the semiconductor industry, the distortion of the projection lens is an important factor that affects the overlay. In this paper, we propose a wavefront-measurement-based method to detect the...
| Main Authors: | , , , , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2023-02-01
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| Series: | Photonics |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2304-6732/10/2/168 |