Preparation of Cu thin film by cylindrical magnetron sputtering device
In the present work, a D.C. magnetron sputtering system was designed and fabricated. This chamber of this system includes two coaxial cylinders made from copper .the inner one used as a cathode while the outer one used as a node. The magnetic coils located on the outer cylinder (anode) .The profile...
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| Format: | Article |
| Language: | English |
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University of Baghdad
2009-12-01
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| Series: | Iraqi Journal of Physics |
| Subjects: | |
| Online Access: | https://ijp.uobaghdad.edu.iq/index.php/physics/article/view/910 |
| _version_ | 1827990791050493952 |
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| author | Rahman R. Abdula |
| author_facet | Rahman R. Abdula |
| author_sort | Rahman R. Abdula |
| collection | DOAJ |
| description |
In the present work, a D.C. magnetron sputtering system was
designed and fabricated. This chamber of this system includes two
coaxial cylinders made from copper .the inner one used as a cathode
while the outer one used as a node. The magnetic coils located on
the outer cylinder (anode) .The profile of magnetic field for various
coil current (from 2Amp to 14Amp) are shown. The effect of
different magnetic field on the Cu thin films thickness at constant
pressure of 7x10-5mbar is investigated. The result shown that, the
electrical behavior of the discharge strongly depends on the values
of the magnetic field and shows an optimum value at which the
power absorbed by the plasma is maximum. Furthermore, the
plasma characterization was also measured by Planar Langmuir
probe to given information bout the behavior of plasma through the
sputtering process
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| first_indexed | 2024-04-10T00:40:50Z |
| format | Article |
| id | doaj.art-9289a9c5e0e443769d697bbc9e2ad283 |
| institution | Directory Open Access Journal |
| issn | 2070-4003 2664-5548 |
| language | English |
| last_indexed | 2024-04-10T00:40:50Z |
| publishDate | 2009-12-01 |
| publisher | University of Baghdad |
| record_format | Article |
| series | Iraqi Journal of Physics |
| spelling | doaj.art-9289a9c5e0e443769d697bbc9e2ad2832023-03-14T05:50:11ZengUniversity of BaghdadIraqi Journal of Physics2070-40032664-55482009-12-0178Preparation of Cu thin film by cylindrical magnetron sputtering deviceRahman R. Abdula0Department of Physics, College of Science, University of Baghdad, Jadiriya, Baghdad, Iraq In the present work, a D.C. magnetron sputtering system was designed and fabricated. This chamber of this system includes two coaxial cylinders made from copper .the inner one used as a cathode while the outer one used as a node. The magnetic coils located on the outer cylinder (anode) .The profile of magnetic field for various coil current (from 2Amp to 14Amp) are shown. The effect of different magnetic field on the Cu thin films thickness at constant pressure of 7x10-5mbar is investigated. The result shown that, the electrical behavior of the discharge strongly depends on the values of the magnetic field and shows an optimum value at which the power absorbed by the plasma is maximum. Furthermore, the plasma characterization was also measured by Planar Langmuir probe to given information bout the behavior of plasma through the sputtering process https://ijp.uobaghdad.edu.iq/index.php/physics/article/view/910cylindrical Magnetron sputtering. D C sputtering, abnormal glow discharge |
| spellingShingle | Rahman R. Abdula Preparation of Cu thin film by cylindrical magnetron sputtering device Iraqi Journal of Physics cylindrical Magnetron sputtering. D C sputtering, abnormal glow discharge |
| title | Preparation of Cu thin film by cylindrical magnetron sputtering device |
| title_full | Preparation of Cu thin film by cylindrical magnetron sputtering device |
| title_fullStr | Preparation of Cu thin film by cylindrical magnetron sputtering device |
| title_full_unstemmed | Preparation of Cu thin film by cylindrical magnetron sputtering device |
| title_short | Preparation of Cu thin film by cylindrical magnetron sputtering device |
| title_sort | preparation of cu thin film by cylindrical magnetron sputtering device |
| topic | cylindrical Magnetron sputtering. D C sputtering, abnormal glow discharge |
| url | https://ijp.uobaghdad.edu.iq/index.php/physics/article/view/910 |
| work_keys_str_mv | AT rahmanrabdula preparationofcuthinfilmbycylindricalmagnetronsputteringdevice |