Effects of Micromachining Processes on Electro-Osmotic Flow Mobility of Glass Surfaces

Effects of Micromachining Processes on Electro-Osmotic Flow Mobility of Glass Surfaces

Silica glass is frequently used as a device material for micro/nano fluidic devices due to its excellent properties, such as transparency and chemical resistance. Wet etching by hydrofluoric acid and dry etching by neutral loop discharge (NLD) plasma etching are currently used to micromachine glass...

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Bibliographic Details
Main Authors: Norihisa Miki, Koichi Hishida, Reiko Kuriyama, Yohei Sato, Yosuke Koga
Format: Article
Language:English
Published: MDPI AG 2013-03-01
Series:Micromachines
Subjects:
surface roughness
electro-osmotic flow
glass
MicroTAS
nanofluidics
zeta potential
neutral loop discharge plasma etching
dry etching
wet etching
Online Access:http://www.mdpi.com/2072-666X/4/1/67

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http://www.mdpi.com/2072-666X/4/1/67

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