Optimum Adjustment for Distortion in Semiconductor Lithography Equipment
In this paper, we consider the problem of lens distortion adjustment of semiconductor lithography equipment. The objective of adjustment is to minimize the maximum absolute value of distortion. Formerly, an approximate solution method based on the least-squares method has been used. Recently, an app...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
The Japan Society of Mechanical Engineers
2008-07-01
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| Series: | Journal of Advanced Mechanical Design, Systems, and Manufacturing |
| Subjects: | |
| Online Access: | https://www.jstage.jst.go.jp/article/jamdsm/2/3/2_3_378/_pdf/-char/en |