Stearic Acid as an Atomic Layer Deposition Inhibitor: Spectroscopic Insights from AFM-IR

Stearic Acid as an Atomic Layer Deposition Inhibitor: Spectroscopic Insights from AFM-IR

Modern-day chip manufacturing requires precision in placing chip materials on complex and patterned structures. Area-selective atomic layer deposition (AS-ALD) is a self-aligned manufacturing technique with high precision and control, which offers cost effectiveness compared to the traditional patte...

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Bibliographic Details
Main Authors: Saumya Satyarthy, Md Hasan Ul Iqbal, Fairoz Abida, Ridwan Nahar, Adam J. Hauser, Mark Ming-Cheng Cheng, Ayanjeet Ghosh
Format: Article
Language:English
Published: MDPI AG 2023-10-01
Series:Nanomaterials
Subjects:
atomic layer deposition
carboxylic acid
self-assembled monolayers
inhibitor
atomic-force microscopy
infrared spectroscopy
Online Access:https://www.mdpi.com/2079-4991/13/19/2713

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https://www.mdpi.com/2079-4991/13/19/2713

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