Development of controlled nanosphere lithography technology

Development of controlled nanosphere lithography technology

Abstract This work is devoted to the development of nanosphere lithography (NSL) technology, which is a low-cost and efficient method to form nanostructures for nanoelectronics, as well as optoelectronic, plasmonic and photovoltaic applications. Creating a nanosphere mask by spin-coating is a promis...

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Bibliographic Details
Main Authors: Artem A. Osipov, Alina E. Gagaeva, Anastasiya B. Speshilova, Ekaterina V. Endiiarova, Polina G. Bespalova, Armenak A. Osipov, Ilya A. Belyanov, Kirill S. Tyurikov, Irina A. Tyurikova, Sergey E. Alexandrov
Format: Article
Language:English
Published: Nature Portfolio 2023-02-01
Series:Scientific Reports
Online Access:https://doi.org/10.1038/s41598-023-29077-y

Internet

https://doi.org/10.1038/s41598-023-29077-y

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