Effect of film thickness on the electrical transport in Co2FeAl0.5Si0.5 thin films
The effect of film thickness on the structural- and electrical-properties is investigated in Co2FeAl0.5Si0.5 (CFAS) thin films of thickness, t, in the range 12–75 nm. These films are grown by ultrahigh vacuum dc magnetron sputtering on Si(100) substrates with SiO2 buffer layer (300 nm), at the subst...
| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2023-02-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/9.0000486 |