Phonon frequencies of a highly strained AlN layer coherently grown on 6H-SiC (0001)

Phonon frequencies of a high-quality AlN layer coherently grown on a 6H-SiC (0001) substrate are investigated by Raman scattering. Owing to the largest strain in our coherent AlN layer among heteroepitaxially grown AlN layers ever reported, phonon frequencies of the E2 (low), E2 (high), and A1 (LO)...

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Main Authors: M. Kaneko, T. Kimoto, J. Suda
Format: Article
Language:English
Published: AIP Publishing LLC 2017-01-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.4974500
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author M. Kaneko
T. Kimoto
J. Suda
author_facet M. Kaneko
T. Kimoto
J. Suda
author_sort M. Kaneko
collection DOAJ
description Phonon frequencies of a high-quality AlN layer coherently grown on a 6H-SiC (0001) substrate are investigated by Raman scattering. Owing to the largest strain in our coherent AlN layer among heteroepitaxially grown AlN layers ever reported, phonon frequencies of the E2 (low), E2 (high), and A1 (LO) modes are considerably shifted to 244.5 (−3.3, compared with bulk AlN), 672.1 (+16.3), and 899 (+11)cm−1, respectively. Full widths at half maximum of the phonon modes in the coherent AlN are almost equal to those of high-quality bulk AlN, clearly indicating its high crystalline quality and uniform strain. We discuss accuracy of phonon deformation potentials reported by several other groups thorough comparing our experimental results.
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spelling doaj.art-939ede59d30148fcbd86c4fcb85ed0982022-12-21T18:40:17ZengAIP Publishing LLCAIP Advances2158-32262017-01-0171015105015105-510.1063/1.4974500045701ADVPhonon frequencies of a highly strained AlN layer coherently grown on 6H-SiC (0001)M. Kaneko0T. Kimoto1J. Suda2Department of Electronic Science and Engineering, Kyoto University, Kyoto 615-8510, JapanDepartment of Electronic Science and Engineering, Kyoto University, Kyoto 615-8510, JapanDepartment of Electronic Science and Engineering, Kyoto University, Kyoto 615-8510, JapanPhonon frequencies of a high-quality AlN layer coherently grown on a 6H-SiC (0001) substrate are investigated by Raman scattering. Owing to the largest strain in our coherent AlN layer among heteroepitaxially grown AlN layers ever reported, phonon frequencies of the E2 (low), E2 (high), and A1 (LO) modes are considerably shifted to 244.5 (−3.3, compared with bulk AlN), 672.1 (+16.3), and 899 (+11)cm−1, respectively. Full widths at half maximum of the phonon modes in the coherent AlN are almost equal to those of high-quality bulk AlN, clearly indicating its high crystalline quality and uniform strain. We discuss accuracy of phonon deformation potentials reported by several other groups thorough comparing our experimental results.http://dx.doi.org/10.1063/1.4974500
spellingShingle M. Kaneko
T. Kimoto
J. Suda
Phonon frequencies of a highly strained AlN layer coherently grown on 6H-SiC (0001)
AIP Advances
title Phonon frequencies of a highly strained AlN layer coherently grown on 6H-SiC (0001)
title_full Phonon frequencies of a highly strained AlN layer coherently grown on 6H-SiC (0001)
title_fullStr Phonon frequencies of a highly strained AlN layer coherently grown on 6H-SiC (0001)
title_full_unstemmed Phonon frequencies of a highly strained AlN layer coherently grown on 6H-SiC (0001)
title_short Phonon frequencies of a highly strained AlN layer coherently grown on 6H-SiC (0001)
title_sort phonon frequencies of a highly strained aln layer coherently grown on 6h sic 0001
url http://dx.doi.org/10.1063/1.4974500
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AT tkimoto phononfrequenciesofahighlystrainedalnlayercoherentlygrownon6hsic0001
AT jsuda phononfrequenciesofahighlystrainedalnlayercoherentlygrownon6hsic0001