Local dose distribution and changing resist cross-sectional shapes in electron beam lithography
In order to apply resist patterns fabricated by electron beam lithography to nanoimprint molds, it is necessary to consider not only line widths and hole diameters observed two-dimensionally from the exposure top surface, but also three-dimensionally including resist cross-sectional shapes. In this...
| Main Authors: | , |
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| Format: | Article |
| Language: | Japanese |
| Published: |
The Japan Society of Mechanical Engineers
2024-01-01
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| Series: | Nihon Kikai Gakkai ronbunshu |
| Subjects: | |
| Online Access: | https://www.jstage.jst.go.jp/article/transjsme/90/930/90_23-00232/_pdf/-char/en |